Method of manufacturing semiconductor structure having dummy pattern around array area

ABSTRACT

The present disclosure provides a method of manufacturing a semiconductor structure. The method includes providing a substrate defined with a peripheral region and an array area at least partially surrounded by the peripheral region; disposing an insulating layer over the substrate; disposing a capping layer over the insulating layer; disposing a hardmask stack on the capping layer; patterning the hardmask stack; removing portions of the capping layer exposed through the hardmask stack; removing portions of the insulating layer exposed through the hardmask stack; removing portions of the substrate exposed through the capping layer and the insulating layer to form a plurality of fins in the array area and a first elongated member at least partially surrounding the plurality of fins; removing the hardmask stack; and forming an isolation over the substrate and surrounding the plurality of fins and the first elongated member.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a divisional application of U.S. Non-Provisionalapplication Ser. No. 16/902,726 filed Jun. 16, 2020, which isincorporated herein by reference in its entirety.

TECHNICAL FIELD

The present disclosure relates to a method of manufacturing asemiconductor structure. Particularly, the present disclosure relates toa method of manufacturing a semiconductor structure having a dummypattern around an array area of a substrate and configured to relievestress internal to the array area.

DISCUSSION OF THE BACKGROUND

Semiconductor devices and integrated circuits are becoming more highlyintegrated. The fabrication of semiconductor devices involvessequentially depositing various material layers over a semiconductorwafer, and patterning the material layers using lithography and etchingprocesses to form microelectronic components, including transistors,diodes, resistors and/or capacitors, on or in the semiconductor wafer.

The semiconductor industry continues to improve the integration densityof the microelectronic components by continual reduction of minimumfeature size, which allows more components to be integrated into a givenarea. Smaller package structures with smaller footprints are developedto package the semiconductor devices. In semiconductor memory devices,as the memory capacity of such devices increases, a critical dimensionof patterns in the device is reduced. Such reduction may induce internalstress and may result in misalignment or damage to the elements in thedevice. It is therefore desirable to develop improvements that addressthe aforementioned challenges.

This Discussion of the Background section is provided for backgroundinformation only. The statements in this Discussion of the Backgroundare not an admission that the subject matter disclosed in thisDiscussion of the Background section constitute prior art to the presentdisclosure, and no part of this Discussion of the Background section maybe used as an admission that any part of this application, includingthis Discussion of the Background section, constitutes prior art to thepresent disclosure.

SUMMARY

One aspect of the present disclosure provides a semiconductor structure.The semiconductor structure includes a substrate defined with aperipheral region and an array area at least partially surrounded by theperipheral region, wherein the substrate includes a plurality of finsprotruding from the substrate and disposed in the array area, and afirst elongated member protruding from the substrate and at leastpartially surrounding the plurality of fins; an insulating layerdisposed over the plurality of fins and the first elongated member; acapping layer disposed over the insulating layer; and an isolationsurrounding the plurality of fins, the first elongated member, theinsulating layer and the capping layer.

In some embodiments, the first elongated member encircles the pluralityof fins.

In some embodiments, the first elongated member has a width in a rangebetween 150 nm and 1000 nm.

In some embodiments, the first elongated member extends along a boundarybetween the periphery region and the array area.

In some embodiments, the substrate includes a second elongated memberprotruding from the substrate and at least partially surrounding theplurality of fins.

In some embodiments, the second elongated member is disposed between thefirst elongated member and the plurality of fins.

In some embodiments, the second elongated member is at least partiallydisposed between two of the plurality of fins.

In some embodiments, the isolation is disposed between the firstelongated member and the second elongated member.

In some embodiments, the plurality of fins, the first elongated memberand the second elongated member are integrally formed.

In some embodiments, a top surface of the capping layer is substantiallycoplanar with a top surface of the isolation.

In some embodiments, the isolation is disposed between two of theplurality of fins.

In some embodiments, the first elongated member is a dummy pattern.

In some embodiments, the insulating layer and the isolation includeoxide, and the capping layer includes nitride.

In some embodiments, the substrate includes a plurality of blocksprotruding from the substrate, disposed in the peripheral region,covered by the capping layer and surrounded by the isolation.

In some embodiments, the plurality of fins, the first elongated memberand the plurality of blocks are integrally formed.

Another aspect of the present disclosure provides a method ofmanufacturing a semiconductor structure. The method includes steps ofproviding a substrate defined with a peripheral region and an array areaat least partially surrounded by the peripheral region; disposing aninsulating layer over the substrate; disposing a capping layer over theinsulating layer; disposing a hardmask stack on the capping layer;patterning the hardmask stack; removing portions of the capping layerexposed through the hardmask stack; removing portions of the insulatinglayer exposed through the hardmask stack; removing portions of thesubstrate exposed through the capping layer and the insulating layer toform a plurality of fins in the array area and a first elongated memberat least partially surrounding the plurality of fins; removing thehardmask stack; and forming an isolation over the substrate andsurrounding the plurality of fins and the first elongated member.

In some embodiments, the formation of the isolation includes performinga planarizing process to expose a top surface of the capping layerthrough the isolation.

In some embodiments, the patterning of the hardmask stack includesdisposing a photoresist over the hardmask stack, and removing portionsof the hardmask stack exposed through the photoresist.

In some embodiments, the method includes removing portions of thesubstrate exposed through the capping layer and the insulating layer toform a second elongated member between the plurality of fins and thefirst elongated member.

In some embodiments, the plurality of fins, the first elongated memberand the second elongated member are formed simultaneously.

In the present disclosure, a dummy pattern in an elongated configurationis formed to surround fins protruding from a substrate and disposedwithin an array area. A dummy elongated member is formed over thesubstrate and configured to relieve internal stress developed in anisolation between the fins in the array area. As such, distortion of thefins in the array area can be minimized. Therefore, reliability andoverall performance of the semiconductor structure can be improved.

The foregoing has outlined rather broadly the features and technicaladvantages of the present disclosure in order that the detaileddescription of the disclosure that follows may be better understood.Additional features and technical advantages of the disclosure aredescribed hereinafter, and form the subject of the claims of thedisclosure. It should be appreciated by those skilled in the art thatthe concepts and specific embodiments disclosed may be utilized as abasis for modifying or designing other structures, or processes, forcarrying out the purposes of the present disclosure. It should also berealized by those skilled in the art that such equivalent constructionsdo not depart from the spirit or scope of the disclosure as set forth inthe appended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

A more complete understanding of the present disclosure may be derivedby referring to the detailed description and claims. The disclosureshould also be understood to be coupled to the figures' referencenumbers, which refer to similar elements throughout the description.

FIG. 1 is a perspective view of a semiconductor structure in accordancewith some embodiments of the present disclosure.

FIG. 2 is an enlarged cross-sectional view of a portion AA′ of thesemiconductor structure in FIG. 1 .

FIG. 3 is an enlarged top view of a portion BB′ of the semiconductorstructure in FIG. 1 showing a first elongated member in a firstconfiguration.

FIG. 4 is an enlarged top view of the portion BB′ of the semiconductorstructure in FIG. 1 showing the first elongated member in a secondconfiguration.

FIG. 5 is an enlarged top view of a portion BB′ of the semiconductorstructure in FIG. 1 showing the first elongated member in a thirdconfiguration.

FIG. 6 is a flow diagram illustrating a method of manufacturing asemiconductor structure in accordance with some embodiments of thepresent disclosure.

FIGS. 7 through 38 illustrate cross-sectional views of intermediatestages in the manufacturing of a semiconductor structure in accordancewith some embodiments of the present disclosure.

DETAILED DESCRIPTION

Embodiments, or examples, of the disclosure illustrated in the drawingsare now described using specific language. It shall be understood thatno limitation of the scope of the disclosure is hereby intended. Anyalteration or modification of the described embodiments, and any furtherapplications of principles described in this document, are to beconsidered as normally occurring to one of ordinary skill in the art towhich the disclosure relates. Reference numerals may be repeatedthroughout the embodiments, but this does not necessarily mean thatfeature(s) of one embodiment apply to another embodiment, even if theyshare the same reference numeral.

It shall be understood that, although the terms first, second, third,etc. may be used herein to describe various elements, components,regions, layers or sections, these elements, components, regions, layersor sections are not limited by these terms. Rather, these terms aremerely used to distinguish one element, component, region, layer orsection from another element, component, region, layer or section. Thus,a first element, component, region, layer or section discussed belowcould be termed a second element, component, region, layer or sectionwithout departing from the teachings of the present inventive concept.

The terminology used herein is for the purpose of describing particularexample embodiments only and is not intended to be limiting to thepresent inventive concept. As used herein, the singular forms “a,” “an”and “the” are intended to include the plural forms as well, unless thecontext clearly indicates otherwise. It shall be understood that theterms “comprises” and “comprising,” when used in this specification,point out the presence of stated features, integers, steps, operations,elements, or components, but do not preclude the presence or addition ofone or more other features, integers, steps, operations, elements,components, or groups thereof.

FIG. 1 is a schematic perspective view of a semiconductor structure 100in accordance with some embodiments of the present disclosure. Further,FIG. 2 is an enlarged cross-sectional view of a portion AA of thesemiconductor structure 100 in FIG. 1 , and FIG. 3 is an enlarged topview of a portion BB′ of the semiconductor structure 100 in FIG. 1 .

In some embodiments, the semiconductor structure 100 is a part of a die,a package or a device. In some embodiments, the semiconductor structure100 is a part of a memory device. In some embodiments, the semiconductorstructure 100 includes a substrate 101, an insulating layer 102, acapping layer 103 and an isolation 104.

In some embodiments, the substrate 101 is a semiconductive substrate. Insome embodiments, the substrate 101 includes semiconductive materialsuch as silicon, germanium, gallium, arsenic, or a combination thereof.In some embodiments, the substrate 101 includes bulk semiconductormaterial. In some embodiments, the substrate 101 is a silicon substrate.In some embodiments, the substrate 101 includes lightly dopedmonocrystalline silicon. In some embodiments, the substrate 101 is ap-type substrate.

Referring to FIG. 1 , the substrate 101 includes a first surface 101 aand a second surface 101 b opposite to the first surface 101 a. In someembodiments, the first surface 101 a is a front side of the substrate101, wherein electrical devices or components are subsequently formedover the first surface 101 a and configured to electrically connect toan external circuitry. In some embodiments, the second surface 101 b isa back side of the substrate 101, where electrical devices or componentsare absent.

In some embodiments, the substrate 101 defines a peripheral region 101 cand an array area 101 d at least partially surrounded by the peripheralregion 101 c. In some embodiments, the peripheral region 101 c isadjacent to a periphery of the substrate 101, and the array area 101 dis adjacent to a central area of the substrate 101. In some embodiments,the array area 101 d may be used for fabricating field effect verticaltransistors. In some embodiments, a boundary 101 e is disposed betweenthe peripheral region 101 c and the array area 101 d.

Referring to FIGS. 1 to 3 , the substrate 101 includes several fins 101f, a first elongated member 101 g disposed in the array area 101 d, asecond elongated member 101 h surrounding the fins 101 f, and severalblocks 101 i in the peripheral region 101 c. In some embodiments, thefins 101 f, the first elongated member 101 g, the second elongatedmember 101 h and the blocks 101 i protrude from the substrate 101 or thefirst surface 101 a of the substrate 101. In some embodiments, the fins101 f, the first elongated member 101 g, the second elongated member 101h and the blocks 101 i are integrally formed.

In some embodiments, the fins 101 f are arranged in an array or matrix.In some embodiments, heights of the fins 101 f are consistent with eachother. In some embodiments, the height of the fin 101 f is in a rangebetween 30 nm and 200 nm. In some embodiments, a pitch between adjacentpairs of fins 101 f is consistent. In some embodiments, the fin 101 fhas a cylindrical shape. In some embodiments, a cross section of the fin101 f has a circular, oval, quadrilateral or polygonal shape.

In some embodiments, the first elongated member 101 g partially orentirely surrounds the fins 101 f. In some embodiments, the firstelongated member 101 g encircles the fins 101 f. In some embodiments,the first elongated member 101 g extends along the boundary 101 ebetween the peripheral region 101 c and the array area 101 d. In someembodiments, the first elongated member 101 g is a dummy pattern, i.e.,the first elongated member 101 g is electrically isolated from circuitor device of the semiconductor structure 100.

In some embodiments, the first elongated member 101 g has a width in arange between 150 nm and 1000 nm. In some embodiments, a distancebetween the first elongated member 101 g and the outermost fin among thefins 101 f is in a range between 100 nm and 500 nm. In some embodiments,a top cross section of the first elongated member 101 g is in a strip,frame or ring configuration. In some embodiments, the height of the fins101 f is substantially same as a height of the first elongated member101 g.

Referring to FIGS. 3 to 5 , the first elongated member 101 g can be invarious configurations. In some embodiments, as shown in FIG. 3 , thefirst elongated member 101 g surrounds the fins 101 f in a stripconfiguration. In some embodiments, as shown in FIG. 4 , the firstelongated member 101 g is in a zig-zag configuration. In someembodiments, as shown in FIG. 5 , the first elongated member 101 gcomprises several segments, each of which extends along a portion of theboundary 101 e. In some embodiments, the segments are discontinuous andseparated from each other.

In some embodiments, the second elongated member 101 h partially orentirely surrounds the fins 101 f. In some embodiments, the secondelongated member 101 h encircles the fins 101 f. In some embodiments,the second elongated member 101 h extends between the first elongatedmember 101 g and the fins 101 f. In some embodiments, the secondelongated member 101 h is at least partially disposed between two of thefins 101 f. In some embodiments, the second elongated member 101 h isproximal to the fins 101 f and distal to the first elongated member 101g.

In some embodiments, the width of the first elongated member 101 g issubstantially greater than a width of the second elongated member 101 h.In some embodiments, the second elongated member 101 h has a width in arange between 100 nm and 800 nm. In some embodiments, a distance betweenthe second elongated member 101 h and the outermost fin among the fins101 f is in a range between 50 nm and 500 nm. In some embodiments, a topcross section of the second elongated member 101 h is in a strip, frameor ring configuration. In some embodiments, the height of the fins 101 fis substantially same as a height of the second elongated member 101 h.In some embodiments, the height of the first elongated member 101 g issubstantially same as the height of the second elongated member 101 h.

In some embodiments, the blocks 101 i protrude from the substrate 101and are disposed in the peripheral region 101 c. In some embodiments,the blocks 101 i at least partially surround the array area 101 d. Insome embodiments, a cross section of the block 101 has a quadrilateralor polygonal shape. In some embodiments, a width of the block 101 i issubstantially greater than the width of the fin 101 f. In someembodiments, the height of the block 101 i is substantially same as theheight of the fin 101 f. In some embodiments, the height of the block101 i is substantially same as the height of the first elongated member101 g.

Referring to FIG. 1 , the insulating layer 102 is disposed over thesubstrate 101. In some embodiments, the insulating layer 102 is disposedin the peripheral region 101 c and the array area 101 d. In someembodiments, the insulating layer 102 is disposed over the fins 101 f,the first elongated member 101 g, the second elongated member 101 h andthe blocks 101 i. In some embodiments, the insulating layer 102 coversand contacts the first surface 101 a, top surfaces of the fins 101 f, atop surface of the first elongated member 101 g, a top surface of thesecond elongated member 101 h and top surfaces of the block 101 i. Insome embodiments, the insulating layer 102 includes oxide.

In some embodiments, the capping layer 103 is disposed over and incontact with the insulating layer 102. In some embodiments, the cappinglayer 103 is disposed in the peripheral region 101 c and the array area101 d. In some embodiments, the capping layer 103 is disposed over thefirst surface 101 a, the top surfaces of the fins 101 f, the top surfaceof the first elongated member 101 g, the top surface of the secondelongated member 101 h and the top surfaces of the block 101 i. In someembodiments, the capping layer 103 has a thickness substantially greaterthan a thickness of the insulating layer 102. In some embodiments, thecapping layer 103 includes nitride.

In some embodiments, the isolation 104 surrounds the fins 101 f, thefirst elongated member 101 g, the second elongated member 101 h, theblock 101 i, the insulating layer 102 and the capping layer 103. In someembodiments, the isolation 104 is disposed between the first elongatedmember 101 g and the second elongated member 101 h, between the fins 101f and the second elongated member 101 h, and between the fins 101 f. Insome embodiments, at least a portion of the top surface of the cappinglayer 103 is exposed through the isolation 104. In some embodiments, thetop surface of the capping layer 103 is substantially coplanar with atop surface of the isolation 104. In some embodiments, the isolation 104includes oxide. In some embodiments, the insulating layer 102 and theisolation 104 include same or different dielectric materials.

FIG. 6 is a flow diagram illustrating a method S200 of manufacturing asemiconductor structure 100 in accordance with some embodiments of thepresent disclosure. FIGS. 7 to 36 are schematic diagrams illustratingvarious fabrication stages according to the method S200 formanufacturing the semiconductor structure 100 in accordance with someembodiments of the present disclosure. The stages shown in FIGS. 7 to 36are also illustrated schematically in the flow diagram in FIG. 6 . Inthe subsequent discussion, the fabrication stages shown in FIGS. 7 to 36are discussed in reference to the steps shown in FIG. 6 . The methodS200 includes a number of operations and the description andillustration are not deemed as a limitation of the sequence of theoperations. The method S200 includes a number of steps (S201, S202,S203, S204, S205, S206, S207, S208, S209 and S210).

Referring to FIG. 7 , a substrate 101 is provided or received accordingto step S201 in FIG. 6 . In some embodiments, the substrate 101 includesbulk semiconductor material, for example silicon. In some embodiments,the substrate 101 may be lightly doped monocrystalline silicon. In someembodiments, the substrate 101 may be a p-type substrate.

In some embodiments, the substrate 101 defines a peripheral region 101 cand an array area 101 d at least partially surrounded by the peripheralregion 101 c. In some embodiments, the substrate 101 defines a boundary101 e between the peripheral region 101 c and the array area 101 d.

Referring to FIG. 7 , an insulating layer 102 is disposed over thesubstrate 101 according to step S202 in FIG. 6 . In some embodiments,the insulating layer 120 is in contact with the substrate 101. In someembodiments, the insulating layer 102 includes oxide such as siliconoxide. In some embodiments, the insulating layer 102 is formed using achemical vapor deposition (CVD) process, a thermal oxidation process orany other suitable process.

Referring to FIG. 7 , a capping layer 103 is disposed over theinsulating layer 102 according to step S203 in FIG. 6 . In someembodiments, the capping layer 103 is disposed on the insulating layer102. In some embodiments, the capping layer 103 includes nitride, e.g.,silicon nitride. In some embodiments, the capping layer 103 may beformed using a CVD process or any other suitable process.

Referring to FIG. 8 , a first hardmask stack 105 is disposed on thecapping layer 103 according to step S204 in FIG. 6 . In someembodiments, the first hardmask stack 105 includes several layersstacked over each other. In some embodiments, the first hardmask stack105 includes a first layer 105 a, a second layer 105 b, a third layer105 c, a fourth layer 105 d, a fifth layer 105 e and a sixth layer 105f. In some embodiments, the first layer 105 a, the second layer 105 b,the third layer 105 c, the fourth layer 105 d, the fifth layer 105 e andthe sixth layer 105 f are sequentially formed over the capping layer103.

In some embodiments, the first layer 105 a is disposed on the cappinglayer 103. In some embodiments, the first layer 105 a includes carbon.In some embodiments, the first layer 105 a is formed by a CVD process orany other suitable process. In some embodiments, the second layer 105 bis disposed over the first layer 105 a. In some embodiments, the secondlayer 105 b includes nitride. In some embodiments, the second layer 105b is formed by a CVD process or any other suitable process. In someembodiments, the first layer 105 a and the second layer 105 b havedifferent compositions from each other to enable selective etching ofeach relative to the other.

In some embodiments, the third layer 105 c is disposed on the secondlayer 105 b. In some embodiments, the third layer 105 c includespolysilicon. In some embodiments, the third layer 105 c is formed by aCVD process or any other suitable process. In some embodiments, thefourth layer 105 d is disposed on the third layer 105 c. In someembodiments, the fourth layer 105 d includes oxide, e.g., silicon oxide.In some embodiments, the fourth layer 105 d is formed by a CVD processor any other suitable process. In some embodiments, the deposition ofthe third layer 105 c and the fourth layer 105 d may be performedin-situ to save processing time and reduce possibility of contamination.As used herein, the term “in-situ” is used to refer to processes inwhich the substrate 101 being processed is not exposed to an externalambient (e.g., external to the processing system) environment.

In some embodiments, the fifth layer 105 e is disposed on the fourthlayer 105 d. In some embodiments, the fifth layer 105 e includes carbon.In some embodiments, the fifth layer 105 e is a sacrificial layer. Insome embodiments, the fifth layer 105 e may be formed using a CVDprocess or any other suitable process. In some embodiments, after thedeposition of the fifth layer 105 e, a polish process may be performedto obtain a flat surface.

In some embodiments, the sixth layer 105 f is disposed on the fifthlayer 105 e. In some embodiments, the sixth layer 105 f includesdielectric material such as nitride or oxynitride. In some embodiments,the sixth layer 105 f is an antireflective coating (ARC) layer. In someembodiments, the sixth layer 105 f may be formed by a plasma-enhancedCVD (PECVD) process.

Referring to FIG. 9 , the first hardmask stack 105 is patternedaccording to step S205 in FIG. 6 . In some embodiments, the patterningof the first hardmask stack 105 includes disposing a first photoresist106 over the first hardmask stack 105, and removing portions of thefirst hardmask stack 105 exposed through the first photoresist 106. Insome embodiments, the first photoresist 106 is patterned after thedisposing of the first photoresist 106 and before the removal ofportions of the first hardmask stack 105. In some embodiments, the firstphotoresist 106 is patterned by photolithography, etching or any othersuitable process.

In some embodiments, the first photoresist 106 includes several slots106 a over the first hardmask stack 105. In some embodiments, portionsof the sixth layer 105 f are exposed through the first photoresist 106.In some embodiments, the sixth layer 105 f is formed between the fifthlayer 105 e and the first photoresist 106 in order to eliminate problemsassociated with reflection of light when exposing the first photoresist106. In some embodiments, the sixth layer 105 f may stabilize an etchingselectivity of the fifth layer 105 e.

Referring to FIG. 10 , portions of the fourth layer 105 d, the fifthlayer 105 e and the sixth layer 105 f exposed through the firstphotoresist 106 are removed. In some embodiments, after the removal ofthe portions of the fourth layer 105 d, the fifth layer 105 e and thesixth layer 105 f exposed through the first photoresist 106, the firstphotoresist 106 and the remaining portion of the sixth layer 105 f areremoved.

Referring to FIG. 11 , an oxide layer 107 is disposed conformal to thefifth layer 105 e. In some embodiments, a coating 108 is disposed overthe oxide layer 107. In some embodiments, the coating 108 is anantireflective coating (ARC).

Referring to FIG. 12 and FIG. 13 showing an enlarged view of a portionCC′ in FIG. 12 , portions of the oxide layer 107 and portions of thefifth layer 105 e are sequentially removed. In some embodiments, theportions of the oxide layer 107 are removed by dry etching or any othersuitable process. In some embodiments, some portions of the oxide layer107 are left remaining on the fourth layer 105 d. As a result, a topsurface of the oxide layer 107 is substantially coplanar with a topsurface of the fourth layer 105 d. In some embodiments, portions of thefourth layer 105 d, portions of the third layer 105 c and portions ofthe second layer 105 b in the array area 101 d are sequentially removed.As such, several strips 109 protruding from the second layer 105 b areformed in the array area 101 d.

Referring to FIG. 14 , a seventh layer 110 is disposed over the fourthlayer 105 d and the oxide layer 107, and an eighth layer 111 is thendisposed over the seventh layer 110. In some embodiments, the seventhlayer 110 fills gaps between the strips 109. In some embodiments, theseventh layer 110 includes carbon. In some embodiments, the seventhlayer 110 is a sacrificial layer. In some embodiments, the seventh layer110 may be formed using a CVD process or any other suitable process. Insome embodiments, after the deposition of the seventh layer 110, apolish process may be performed to obtain a flat surface.

In some embodiments, the eighth layer 111 is disposed on the seventhlayer 110. In some embodiments, the eighth layer 111 includes dielectricmaterial such as nitride or oxynitride. In some embodiments, the eighthlayer 111 is an antireflective coating (ARC) layer. In some embodiments,the eighth layer 111 may be formed by a plasma-enhanced CVD (PECVD)process.

Referring to FIG. 15 , a second photoresist 112 is disposed over theeighth layer 111. In some embodiments, the second photoresist 112includes a first portion 112 a, a second portion 112 b and several thirdportions 112 c. In some embodiments, the second photoresist 112 ispatterned by removing portions of the second photoresist 112 to form thefirst portion 112 a, the second portion 112 b and the third portions 112c. In some embodiments, the second photoresist 112 is patterned byphotolithography, etching or any other suitable process. In someembodiments, the first portion 112 a is disposed within the array area101 d. In some embodiments, the second portion 112 b is disposed withinthe array area 101 d and extends along the boundary 101 e. In someembodiments, the third portions 112 c are disposed within the peripheralregion 101 c.

After the disposing of the second photoresist 112 over the eighth layer111, several removal steps are performed. FIGS. 16 to 22 are enlargedviews of a portion DD′ in FIG. 15 and illustrate the removal stepsperformed at the portion DD′, and FIGS. 23 to 28 are enlarged views of aportion EE′ in FIG. 15 and illustrate the removal steps performed at theportion EE′.

Referring to FIG. 16 , the second portion 112 b of the secondphotoresist 112 covers the eighth layer 111. Referring to FIG. 17 ,portions of the eighth layer 111 and portions of the seventh layer 110exposed through the second portion 112 b of the second photoresist 112are removed. In some embodiments, several openings 110 a are formed. Insome embodiments, the remaining portion of the eighth layer 111 isremoved after the formation of the openings 110 a.

In some embodiments, the eighth layer 111 is removed by dry etching orany other suitable process. In some embodiments, the second photoresist112 is removed by an ashing process, a wet strip process or any othersuitable process. In some embodiments, the second photoresist 112 may bechemically altered so that it no longer adheres to the remaining portionof the eighth layer 111. In some embodiments, the remaining portion ofthe eighth layer 111 is then removed to expose the remaining portion ofthe seventh layer 110.

Referring to FIG. 18 , the remaining portion of the seventh layer 110 isremoved and the strips 109 are exposed. In some embodiments, theremaining portion of the seventh layer 110 is removed by dry etching orany other suitable process. Referring to FIG. 19 , portions of thesecond layer 105 b are further removed. In some embodiments, theportions of the second layer 105 b are removed by dry etching or anyother suitable process. In some embodiments, several portions of thesecond layer 105 b are left remaining and are isolated from each other.In some embodiments, after the further removal of the portions of thesecond layer 105 b, the oxide layer 107, the fourth layer 105 d and thethird layer 105 c are also removed.

Referring to FIG. 20 , portions of the first layer 105 a exposed throughthe remaining portion of the second layer 105 b are removed. In someembodiments, the portions of the first layer 105 a are removed by dryetching or any other suitable process. In some embodiments, severalportions of the first layer 105 a are left remaining and are isolatedfrom each other. In some embodiments, the remaining portions of thesecond layer 105 b are removed after the removal of the portions of thefirst layer 105 a.

Referring to FIG. 21 , portions of the capping layer 103 and portions ofthe insulating layer 102 exposed through the remaining portions of thefirst layer 105 a are removed. In some embodiments, the portions of thecapping layer 103 and the portions of the insulating layer 102 areremoved simultaneously, sequentially or separately. In some embodiments,the portions of the capping layer 103 are removed, and then the portionsof the insulating layer 102 are removed. In some embodiments, theportions of the capping layer 103 are removed by dry etching or anyother suitable process. In some embodiments, the portions of theinsulating layer 102 are removed by dry etching or any other suitableprocess.

Referring to FIG. 22 , portions of the substrate 101 exposed through theremaining portions of the insulating layer 102, the remaining portionsof the capping layer 103 and the remaining portions of the first layer105 a are removed to form several fins 101 f protruding from thesubstrate 101. In some embodiments, the portions of the substrate 101are removed by dry etching or any other suitable process. In someembodiments, the fins 101 f are separated from each other. In someembodiments, the fin 101 f has a configuration similar to that of thefin 101 f described above or illustrated in FIG. 1 .

As mentioned above, after the disposing of the second photoresist 112over the eighth layer 111 as shown in FIG. 15 , several removal stepsare performed. FIGS. 23 to 28 are enlarged views of the portion EE′ inFIG. 15 and illustrate the removal steps performed at the portion EE′.In some embodiments, the removal steps performed at the portion EE′ aresimilar to the removal steps performed at the portion DD′ describedabove or illustrated in FIGS. 16 to 22 .

Referring to FIG. 23 , the first portion 112 a of the second photoresist112 covers the eighth layer 111. Referring to FIG. 24 , portions of theeighth layer 111 and portions of the seventh layer 110 exposed throughthe first portion 112 a of the second photoresist 112 are removed. Insome embodiments, the remaining portion of the eighth layer 111 is thenremoved. In some embodiments, the eighth layer 111 is removed by dryetching or any other suitable process. In some embodiments, the secondphotoresist 112 is removed by an ashing process, a wet strip process orany other suitable process. In some embodiments, the second photoresist112 may be chemically altered so that it no longer adheres to theremaining portion of the eighth layer 111. In some embodiments, theremaining portion of the eighth layer 111 is then removed to expose theremaining portion of the seventh layer 110.

Referring to FIG. 25 , portions of the fourth layer 105 d, portions ofthe third layer 105 c and portions of the second layer 105 b exposedthrough the remaining portion of the seventh layer 110 are removedsequentially. In some embodiments, the remaining portion of the seventhlayer 110 is removed by dry etching or any other suitable process.

Referring to FIG. 26 , portions of the first layer 105 a exposed throughthe remaining portions of the second layer 105 b are removed. In someembodiments, the portions of the first layer 105 a are removed by dryetching or any other suitable process. In some embodiments, theremaining portion of the second layer 105 b is then removed after theremoval of portions of the first layer 105 a.

Referring to FIG. 27 , portions of the capping layer 103 exposed throughthe remaining portion of the first layer 105 a are removed according tostep S206 in FIG. 6 . In some embodiments, the portions of the cappinglayer 103 are removed by dry etching or any other suitable process. Insome embodiments, portions of the insulating layer 102 exposed throughthe remaining portion of the first layer 105 a are removed according tostep S207 in FIG. 6 . In some embodiments, the portions of theinsulating layer 102 are removed by dry etching or any other suitableprocess. In some embodiments, the portions of the capping layer 103 andthe portions of the insulating layer 102 are removed simultaneously,sequentially or separately. In some embodiments, the portions of thecapping layer 103 are removed, and then the portions of the insulatinglayer 102 are removed.

Referring to FIG. 28 , portions of the substrate 101 exposed through theremaining portion of the insulating layer 102, the remaining portion ofthe capping layer 103 and the remaining portion of the first layer 105 aare removed to form a first elongated member 101 g protruding from thesubstrate 101 according to step S208 in FIG. 6 . In some embodiments,the portions of the substrate 101 are removed by dry etching or anyother suitable process. In some embodiments, the first elongated member101 g is separated from the fins 101 f. In some embodiments, the firstelongated member 101 g has a configuration similar to that of the firstelongated member 101 g described above or illustrated in FIG. 1 .

Referring to FIG. 29 , the remaining portion of the first layer 105 a isremoved by dry etching or any other suitable process. In someembodiments, the remaining portion of the first layer 105 a is a part ofa hardmask stack. In some embodiments, the hardmask stack is removedaccording to step S209 in FIG. 6 . As mentioned above, after thedisposing of the second photoresist 112 over the eighth layer 111 asshown in FIG. 15 , several removal steps are performed. FIG. 30illustrates the intermediate structure after the removal steps describedabove. In some embodiments, the portion DD′ in FIG. 15 becomes a portionFF′ in FIG. 30 , and the portion EE′ in FIG. 15 becomes a portion GG′ inFIG. 30 . FIG. 31 illustrates an enlarged view of the portion FF′, andFIG. 32 illustrates an enlarged view of the portion GG′.

Referring to FIG. 30 , a second elongated member 101 h is formed in away similar to the above steps of forming the first elongated member 101g or the fins 101 f. In some embodiments, the second elongated member101 h is formed between the fins 101 f and the first elongated member101 g. In some embodiments, the second elongated member 101 h, the firstelongated member 101 g and the fins 101 f are formed simultaneously orsequentially. In some embodiments, the second elongated member 101 h hasa configuration similar to that of the second elongated member 101 hdescribed above or illustrated in FIG. 1 .

In some embodiments, several blocks 101 i are formed in the peripheralregion 101 c. In some embodiments, the blocks 101 i are formed in a waysimilar to the above steps of forming the first elongated member 101 gor the fins 101 f. In some embodiments, the second elongated member 101h, the first elongated member 101 g, the fins 101 f and the blocks 101 iare formed simultaneously or sequentially. In some embodiments, theblocks 101 i have a configuration similar to that of the blocks 101 idescribed above or illustrated in FIG. 1 .

Referring to FIG. 33 , FIG. 34 showing an enlarged view of a portion HH′in FIG. 33 , and FIG. 35 showing an enlarged view of a portion JJ′ inFIG. 33 , an isolation 104 is formed over the substrate 101 andsurrounding the fins 101 f, the first elongated member 101 g, the secondelongated member 101 h and the blocks 101 i according to step S210 inFIG. 6 . In some embodiments, the isolation 104 is disposed betweenadjacent fins 101 f, between the first elongated member 101 g and thesecond elongated member 101 h, and between the fins 101 f and the secondelongated member 101 h.

Referring to FIG. 36 , FIG. 37 showing an enlarged view of a portion KK′in FIG. 36 , and FIG. 38 showing an enlarged view of a portion LL′ inFIG. 36 , a planarizing process is performed to expose the capping layer103. In some embodiments, a top surface of the capping layer 103 isexposed through the isolation 104. In some embodiments, the top surfaceof the capping layer 103 is substantially coplanar with a top surface ofthe isolation 104. Accordingly, a semiconductor structure 100 as shownin FIG. 1 is formed.

In the present disclosure, a dummy pattern in an elongated configurationis formed to surround fins protruding from a substrate and disposedwithin an array area. A dummy elongated member is formed over thesubstrate and configured to relieve internal stress developed in anisolation between the fins in the array area. As such, distortion of thefins in the array area can be minimized. Therefore, reliability andoverall performance of the semiconductor structure can be improved.

One aspect of the present disclosure provides a semiconductor structure.The semiconductor structure includes a substrate defined with aperipheral region and an array area at least partially surrounded by theperipheral region, wherein the substrate includes a plurality of finsprotruding from the substrate and disposed in the array area, and afirst elongated member protruding from the substrate and at leastpartially surrounding the plurality of fins; an insulating layerdisposed over the plurality of fins and the first elongated member; acapping layer disposed over the insulating layer; and an isolationsurrounding the plurality of fins, the first elongated member, theinsulating layer and the capping layer.

Another aspect of the present disclosure provides a method ofmanufacturing a semiconductor structure. The method includes steps ofproviding a substrate defined with a peripheral region and an array areaat least partially surrounded by the peripheral region; disposing aninsulating layer over the substrate; disposing a capping layer over theinsulating layer; disposing a hardmask stack on the capping layer;patterning the hardmask stack; removing portions of the capping layerexposed through the hardmask stack; removing portions of the insulatinglayer exposed through the hardmask stack; removing portions of thesubstrate exposed through the capping layer and the insulating layer toform a plurality of fins in the array area and a first elongated memberat least partially surrounding the plurality of fins; removing thehardmask stack; and forming an isolation over the substrate andsurrounding the plurality of fins and the first elongated member.

Although the present disclosure and its advantages have been describedin detail, it should be understood that various changes, substitutionsand alterations can be made herein without departing from the spirit andscope of the disclosure as defined by the appended claims. For example,many of the processes discussed above can be implemented in differentmethodologies and replaced by other processes, or a combination thereof.

Moreover, the scope of the present application is not intended to belimited to the particular embodiments of the process, machine,manufacture, composition of matter, means, methods and steps describedin the specification. As one of ordinary skill in the art will readilyappreciate from the present disclosure, processes, machines,manufacture, compositions of matter, means, methods or steps, presentlyexisting or later to be developed, that perform substantially the samefunction or achieve substantially the same result as the correspondingembodiments described herein, may be utilized according to the presentdisclosure. Accordingly, the appended claims are intended to includewithin their scope such processes, machines, manufacture, compositionsof matter, means, methods and steps.

What is claimed is:
 1. A method of manufacturing a semiconductorstructure, comprising: providing a substrate defined with a peripheralregion and an array area at least partially surrounded by the peripheralregion; disposing an insulating layer over the substrate; disposing acapping layer over the insulating layer; disposing a hardmask stack onthe capping layer; patterning the hardmask stack; removing portions ofthe capping layer exposed through the hardmask stack; removing portionsof the insulating layer exposed through the hardmask stack; removingportions of the substrate exposed through the capping layer and theinsulating layer to form a plurality of fins in the array area and afirst elongated member at least partially surrounding the plurality offins; removing the hardmask stack; and forming an isolation over thesubstrate and surrounding the plurality of fins and the first elongatedmember.
 2. The method of claim 1, wherein the formation of the isolationincludes performing a planarizing process to expose a top surface of thecapping layer through the isolation.
 3. The method of claim 2, whereinthe top surface of the capping layer is substantially coplanar with atop surface of the isolation.
 4. The method of claim 1, wherein thepatterning of the hardmask stack includes disposing a photoresist overthe hardmask stack, and removing portions of the hardmask stack exposedthrough the photoresist.
 5. The method of claim 1, further comprisingremoving portions of the substrate exposed through the capping layer andthe insulating layer to form a second elongated member between theplurality of fins and the first elongated member.
 6. The method of claim5, wherein the plurality of fins, the first elongated member and thesecond elongated member are formed simultaneously.
 7. The method ofclaim 1, wherein the first elongated member has a width in a rangebetween 150 nm and 1000 nm.
 8. The method of claim 1, wherein the firstelongated member extends along a boundary between the peripheral regionand the array area.
 9. The method of claim 8, wherein the substrateincludes a second elongated member protruding from the substrate and atleast partially surrounding the plurality of fins.
 10. The method ofclaim 9, wherein the second elongated member is disposed between thefirst elongated member and the plurality of fins.
 11. The method ofclaim 9, wherein the second elongated member is at least partiallydisposed between two of the plurality of fins.
 12. The method of claim9, wherein the isolation is disposed between the first elongated memberand the second elongated member.
 13. The method of claim 9, wherein theplurality of fins, the first elongated member and the second elongatedmember are integrally formed.
 14. The method of claim 1, wherein theisolation is disposed between two of the plurality of fins.
 15. Themethod of claim 1, wherein the substrate includes a plurality of blocksprotruding from the substrate, disposed in the peripheral region,covered by the capping layer and surrounded by the isolation.
 16. Themethod of claim 1, wherein the first elongated member is a dummypattern.
 17. The method of claim 1, wherein the insulating layer and theisolation include oxide, and the capping layer includes nitride.
 18. Themethod of claim 15, wherein the plurality of fins, the first elongatedmember and the plurality of blocks are integrally formed.